It features all imprint forms: thermal, photo-curable, and embossing, with sub-5 nm imprinting resolution, up to 8 inches wafer size.
Based on the Nanonex unique patented Air Cushion PressTM technology, the NX-2608BA offers unsurpassed uniformity regardless of backside topology, wafer or mask flatness, or backside contamination. This ACP technology also eliminates lateral shifting between the mask and substrate, which significantly increases mask lifetime. The small thermal mass design allows fast thermal cycling, resulting in a fast process cycle.
The new NX-2600BA system is the second Nanonex nanoimprint equipment purchased by UMass Amherst. Both Nanonex nanoimprint systems will be located at the new UMass Life Sciences Center at UMass Amherst to support the center’s multidisciplinary research, that include nanoimprint material and processing, nanoimprint mold fabrication and duplication, roll-to-roll nanoimprint, bio/chemical sensors, etc.
Nanonex is excited to supply the cutting-edge nanoimprint tool to UMass Amherst’s new Life Sciences Center.
Source: Nanonex
