Researchers from the NSF Center for Hierarchical Manufacturing and NIST have discovered a new, inexpensive method to generate polymers for high-volume nanomanufacturing templates that can accomodate feature sizes of under 5 nm.
Read their statement.
Researchers from the NSF Center for Hierarchical Manufacturing and NIST have discovered a new, inexpensive method to generate polymers for high-volume nanomanufacturing templates that can accomodate feature sizes of under 5 nm.
Read their statement.
This project is supported by the National Science Foundation CMMI-1025020
Center for Hierarchical Manufacturing