Ion induced etching
use of a focused ion beam to induce the localized reaction of an adsorbed molecule to etch the substrate material [SOURCE: ISO/TS 80004-8 v1, 7.1.13]
use of a focused ion beam to induce the localized reaction of an adsorbed molecule to etch the substrate material [SOURCE: ISO/TS 80004-8 v1, 7.1.13]
This project is supported by the National Science Foundation CMMI-1025020
Center for Hierarchical Manufacturing