use of accelerated ions in conjunction with a mask to create nanoscale (2.7) exposure patterns in resist [SOURCE: ISO/TS 80004-8 v1, 7.1.14]
NPGS is the top selling SEM lithography system at research institutions in North America and its use has become widespread around the world. Nanometer Pattern Generation System (NPGS) for electron beam and ion beam lithography using a commercial SEM, STEM, FIB, or dual beam microscope.
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This project is supported by the National Science Foundation CMMI-1025020
Center for Hierarchical Manufacturing
