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Nanomanufacturing Summit 2009: Day 2 Brief

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Nanomanufacturing Summit 2009
The Nanomanufacturing Summit 2009 was held in Boston, MA from May 27 - 29, 2009. The second day of the event featured a plenary session and two parallel sessions ranging from Emerging Processes and Tools to Nanotechnology Business and Commercialization. Two luncheon discussion panels broke up the day's events. Briefs from the sessions follow.

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A Plenary Session covered aspects of nanomanufacturing from representatives from government, academia and industry. Chris Hartshorn of Lux Research described business perspectives of nanotechnology now that the initial investment hype has passed. Studies by Lux find that the best profit margin along the value chain is for nanointermediates. He points out that there is great investment interest in cleantech--renewable energy technologies--for which nanotechnology is the major underlying enabling driver. David Narum of FEI Company described their ongoing strategy to provide measurement tools for nanotechnology, and how the company product line has evolved to also incorporate nanomanufacturing capabilities. He described several case studies of FEI tools providing both feedback and feedforward measurement capabilities for in-line automated nanomanufacturing process control. Shaochen Chen, program manager of the NSF’s nanomanufacturing program, described the scope of the NSF Engineering Directorate and the range of nanomanufacturing research projects supported.  He emphasized the importance for ongoing research of nanomanufacturing processes and enabling tools and how, for example, these efforts are making great strides towards improving energy efficiency and renewable energy products.

In a session on Emerging Processes and Tools, speakers presented perspectives on new fabrication processes and enabling tools.  Hang Pan from the University of California Berkeley discussed a method for programmable ablation nanolithography that used an array of near-field scanning optical microscopy tips excited by a laser. He also discussed laser techniques for local dopant activation of silicon nanowires and annealing out defects. Isaac Moran of the University of Massachusetts Amherst described an Easy Soft Imprint Nano-Lithography (ESINL) method developed to make nano-imprint lithography work well for thin films. The technique can be used to pattern any material that can be evaporated or for patterns for subsequent surface chemistry. Jodie Lutkenhaus of Yale University discussed the use of conformal layer-by-layer polyelectrolyte deposition to make nanotubes using a template. This process can be used inside a nanoporous template, such as anodized alumina, or outside of an array of vertical nanoscale cylinders or wires.

In a session on Integrated Nanoelectronics, speakers presented approaches for integration of nanoelements with conventional electronics, as well as challenges and roadmaps for future nanoelectronic manufacturing. Dan Herr from SRC presented an overview of the Nanoelectronics research Initiative (NRI). While illustrating the benefit of the consortia-based developments that have continued to drive the integrated circuit industry to sub-100nm features, he further emphasized two key points in the industry: first that integrated circuit process improvements must address both upstream and downstream process steps in order to be effective and, second, that due to significant investments in tooling and processes, it is that much more difficult to replace an existing tool or process. Chia-Ling Chen from Northeastern University discussed the heterogeneous integration of single walled carbon nanotubes (SWNTs) with CMOS circuitry in which dielectrophoresis was utilized to direct the assembly of SWNT elements to patterned electrodes on a CMOS circuit chip. The SWNTs were subsequently bonded to the electrodes, functionalized with DNA, and characterized as chemical sensors. Mehmet Dokmeci, also from Northeastern University, presented results from SWNT-based thin film transistors (TFT) on flexible substrates in which dielectrophoretic directed self-assembly was used to integrated individual SWNT gates between pre-patterned source-drain electrode configurations on a Parylene-C layer. The resulting transistors exhibited excellent mobility in comparison to other TFT devices, and the process was demonstrated for 100mm diameter substrates after which the Parylene-C layer was lifted off achieving a flexible thin substrate configuration.

Attendees participated in one of two luncheon panel discussions. The panel on Information Needs for Nanomanufacturing discussed a range of projects aimed at collecting and disseminating information relevant for nanomanufacturing—from best practices for workplace handling of nanomaterials to current needs and drivers for industrial decision-making. Panelists included Manish Mehta of the National Center for Manufacturing Science (NCMS), who described the upcoming NCMS industry survey--a needs identification instrument distributed to companies in the United States to determine trends and develop benchmarking data; Kristin Kulinowksi, Director of the InterNational Council on Nanotechnology, who presented the GoodNanoGuide wiki, a new site for collecting and disseminated best practices for the safe handling of nanomaterials; Anne Chaka, Senior Research Scientist at the National Institute of Standards and Technology, who described the challenges of capturing chemical and physical property data for nanomaterials and encourage the collaborative development of simulation and analysis tools; and Phil Lippell, Policy Analyst for the National Nanotechnology Coordination Office, who gave an overview of federal agencies involved in nanotechnology research and suggested that these outputs could be made more useful and more available to the nanotechnology/nanomanufacturing communities. The group then engaged in an exciting discussion on the need for coordinated informatics efforts in support of nanomanufacturing, including potential pilot projects, and recommended a dedicated workshop on the topic.

The panel on Economic Development for Nanomanufacturing addressed approaches for private-public partnerships to expedite the transition of nanotechnologies to commercialization, economic impacts overriding investment costs, directives and opportunities for expanding existing industry consortia, and opportunities for federal and state government investment. Panelists include Dan Herr, from SRC, who provided an overview of roadmaps in the semiconductor industry, and discussed the challenges of implementing new processes and tools within the industry sector. Ed Cupoli of the College of Nanaoscale Science and Engineering, University of Albany, followed up with an assessment of the private-public partnership at Albany Nanotech, along with the challenges and benefits of having multiple industrial partners. Michael Schen with NIST’s Technology Innovation Program, provided an overview of funding opportunities initiated through the TIP, along with a call for whitepapers to develop ideas of new areas of involvement for TIP funding. Sean Murdock of the Nanobusiness Alliance concluded with an broad assessment of the legislative landscape and potential impact on business nanotechnology and nanomanufacturing, citing the increased need for consortia and public-private partnerships for nanotechnology commercialization. The panel then engaged in a series of roundtable discussions surrounding questions from the audience, including the need for industry sector roadmaps, the need for more open collaborations between academic and industrial entities, and the difference in goals for academics as compared to industry.

Speakers from a session entitled Nanomanufacturing Applications: Energy and Environmental described perspectives and methods towards the implementation of nanomanfacturing. Margaret Blohm, nanotech team leader at GE Research, described an approach that focuses research effort on platform materials science nanotechnologies that meet unmet needs and create explicit “nano benefit.” Through research in nanoparticles and nanoengineered surfaces the lab strives to prove value in applications that impact flagship products, including for example a nanotextured “icephobic” surface that could hinder ice formation on jet engines, wind turbines and plane wings. “Krish” Krishnamoorthy of the University of Massachusetts Amherst outlined research on polymer nanotubes that can be used for separation and sensing. The pore walls of polycarbonate membranes were treated with tin salt and then decorated with amphiphilic polymer vesicles or dendrimers, enabling the filtration/separation of small molecules or biomolecules based on size, charge and hydrophobicity. Zachary Holman of the University of Minnesota discussed a scalable method for nanomanufacturing semiconductor nanocrystals within a plasma. Si and Ge nanocrystals have been produced that can be spray deposited or solution cast. Prototype Si/P3HT solar cells made from these nanocrystals show efficiencies around 1.5%.  Andre Taylor of Yale University presented a supercritical fluid, layer-by-layer method to deposit a mesh of carbon nanotubes supporting platinum nanoparticles as a route to effective fuel cell anodes. These electrodes, which use Nafion as a dispersing matrix, yield an impressive fuel cell peak power density of 2540 mW/mg Pt.

A session entitled Advanced Tools and Processes for Nanomanufacturing I described new approaches to lithographic patterning, imprinting and surface engineering.  Michael Walsh of LumArray described a nanoscale patterning method called Zone-Plate-Array Lithography. This maskless technique uses a diffractive lens and beamlets of light turned on and off using MEMS to produce nanoscale exposure patterns with 1 nm positioning accuracy. The ultimate value of this lithographic tool is that, for the scale of pattern produced, it is inexpensive compared to conventional photolithography steppers. David Bogy of the University of California Berkeley described work from the Center for Scalable and Integrated Nanomanufacturing which performs photolithography at nanoscale dimensions with the aid of a plasmonic lensing system. The exposure system has a mechanism similar to that of a hard disk drive, except that the slider head is the plasmonic exposure lens. Features sizes of less than 100 nm are produced at an impressive linear writing speed of 10 m/s. Arjan Giaya of Triton Systems described the company’s system for depositing thin films from a low-energy plasma without needing to use a vacuum environment. A liquid precursor is aerosolized and incorporated into an atmospheric pressure plasma which is then deposited onto the desired substrate. Triton has demonstrated this technique with a wide range of precursors to functionalize surfaces for bioactive, adhesive, hydrophobic, hydrophilic, oleophobic, dielectric or optical film applications. This has been done using a round jet, or alternatively a 1, 4 or 8 foot wide slot aperture with substrate speeds up to 150 ft/min for roll-to-roll applications. Jan Schroers of Yale University described a new technique, similar to thermoplastic forming, for imprinting amorphous metals that can then be used as masters for imprinting other materials such as polymers or other amorphous metals. Since the amorphous metal does not have any crystalline structure down to the single atom size level, very high resolution features to 13 nm and with small edge roughness and high aspect ration have been produced. The imprinted amorphous metal structure can be thermally treated to crystalline form and then used as a master to replicate even another piece of the same amorphous metal.

In the session entitled Nanotechnology Business and Commercialization I, speakers provided various perspectives on the benefits of industry partnerships and technology transition from research laboratory to commercial scale-up. Sean Murdock from the Nanobusiness Alliance discussed aspects of industrial involvement in nanotechnology partnerships. Sharon Smith of Lockheed Martin discussed the impact and opportunities of nanotechnology for defense applications. Emanuele Ostuni from NanoTerra, Inc. gave an overview of their unique business model for technology licensing, transfer and commercialization. Diane Martin from MicroContinuum, Inc. made an enlightening presentation on the importance of protecting one’s intellectual property with examples of what can happen when one does not.

In the Nanotechnology Business and Commercialization II session speakers discussed aspects of commercialization for different technology sectors, as well as models for commercialization. Skip Rung from ONAMI discussed business aspects for nanomanufacturing, including benefits and opportunities of state and regional partnerships for the commercialization of early stage research. Konarka’s Russell Gaudiana discussed aspects of nanomanufacturing for solar cells and applications for flexible organic photovoltaics (PV). Sean Stewart presented both NanoGram’s proprietary laser pyrolysis process for producing precision inorganic nanomaterials useful as nanoscale battery electrode materials and silicon inks for TFT and PV panels. Ed Cupoli from the College of Nanoscale Science and Engineering (CNSE) at the University at Albany described the unique center set-up with significant state funding from New York that attracts corporate partners to the 450,000 sq. ft. complex from around the world. He related how CNSE provides an environment for students, faculty, industry and the surrounding community to learn, innovate and transform ideas into new products.

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