Nanopatterning/Lithography
reproducible creation of a pattern [SOURCE: ISO/TS 80004-8 v1, 3.6]
- 3D lithography
- Block copolymer lithography
- Block copolymer templating
- Colloidal crystal template lithography
- Deep ultraviolet (DUV) lithography
- Dip-pen nanolithography
- Electron-beam lithography
- Extreme ultraviolet (EUV) lithography
- Focused ion-beam (FIB) lithography
- Immersion optics
- Interference lithography
- Ion beam writing
- Ion projection lithography
- Micro-contact printing
- Microfluidic deposition
- Nano-imprint lithography (NIL)
- Nanoscale
- Natural lithography
- Optical lithography
- Phase-contrast photolithography
- Photolithography
- Plasmonic lithography
- Scanning force probe writing
- Scanning tunnelling microscope chemical vapour deposition (STM CVD)
- Soft Lithography
- X-ray lithography
Brion Technologies is the worldwide leader in computational lithography for integrated circuit Lithography-Driven Design and Manufacturing™.
Asylum Research is the technology leader for scanning probe and atomic force microscopes (SPM/AFM) for both materials and bioscience applications.
Abeam Technologies is a company with expertise in microelectronic technology, software development, optics, and electronics. We develop simulation software used in maskmaking and microelectronic industry, fabricate nano-patterns, and are also involved in a variety of projects.
We are recognized for continuing invention and innovation in computed tomography (CT), magnetic resonance imaging (MRI), ultrasound, digital radiography (DR), patient monitoring, and aviation security, with growing capabilities in molecular imaging and advanced motion controls.
Lumarray is a lithography company with a state-of-the-art-patented technology. Our technology, Zone-Plate-Array Lithography (ZPAL), integrates recent advances in microfabrication, micromechanics and fast computing to produce a lithography tool that will handle the lithographic needs of the decades to come.