Skip to content Skip to navigation

Block copolymer lithography

use of microphase separation in diblock copolymers to create polymer templates with nanoscale (2.7) patterns [SOURCE: ISO/TS 80004-8 v1, 7.1.3]

NSF Center for Hierarchical Manufacturing
NSF Center for Hierarchical Manufacturing
710 North Pleasant Street 374 Lederle Graduate Research Center Amherst, MA 01003 USA

The Center for Hierarchical Manufacturing (CHM) at the University of Massachusetts Amherst is an NSF Nanoscale Science and Engineering Center (NSEC) with a focus in on the development of nanomanufacturing processes. The CHM has three Technical Research Group areas (nanoscale materials and processes, nanoelectronics and bionanotechnology) and Process Development Test Beds that advance the implementation of new nanomanufacturing methods, including, for example, block copolymer and nanoimprint patterning technologies.