Deep ultraviolet (DUV) lithography
patterned exposure of a photoactive polymer using ultraviolet light in the wavelength range 100 nm to 280 nm [SOURCE: ISO/TS 80004-8 v1, 7.1.5]
patterned exposure of a photoactive polymer using ultraviolet light in the wavelength range 100 nm to 280 nm [SOURCE: ISO/TS 80004-8 v1, 7.1.5]
This project is supported by the National Science Foundation CMMI-1025020
Center for Hierarchical Manufacturing