Electron-beam lithography

Raith offers innovative instrument solutions for electron beam lithography, ion beam lithography, nano manipulation, electron beam induced deposition and etching.

Since two decades Raith instruments are extensively used within the nano fabrication and nano engineering community. Raith made conventional electron beam lithography accessible to a broad research community world wide.

With sub 10 nm linewidth guaranteed, Raith electron beam lithography systems provide state of the art performance.

The James Watt Nanofabrication Centre @ Glasgow houses over £22M of nanofabrication tools in a 750m2 clean room run as a pseudo-industrial operation by 14 technicians and 4 PhD level research technologists.

Glasgow has over 30 years experience of delivering micro- and nano-fabrication (and in particular electron-beam lithography) to develop solutions in processing, nanotechnology, nanoelectronics, optoelectronics, mm-wave & terahertz, bioengineering, biotechnology, lab-on-a-chip, cleantech & energy, photovoltaics, security & defence and a host of other applications.

Eulitha is a pioneer and leader in production of high-quality nanostructures using advanced lithography techniques. We offer custom-made and standardized nanostructures with resolution extending down to sub-20 nm region.

Eulitha introduced the revolutionary technology in 2010 for low-cost fabrication of photonic nanostructures over large areas. PHABLE is a proprietary lithography technology that is designed to enable production of energy efficient LEDs, solar cells and LCD displays.

The mission of the LNF is to provide effective, efficient, safe, and socially responsible access to advanced nanofabrication equipment and expertise thereby promoting, enabling, and encouraging cutting-edge education, research and business development from materials and individual process steps to entire systems.

The Krishna P. Singh Center for Nanotechnology is a premier facility that integrates state-of-the-art nanotechnology equipment.

Designed by Weiss/Manfredi and due to open in 2013, the 78,000 gross square foot facility will house several multi-user experimental laboratories critical to advanced research and development in nanotechnology. The following connected sections comprise the major components of the building:

NIL Technology ApS (NILT) specializes in nanopatterning and nanoimprint lithography. NILT has experience in meeting complex demands for research and new product development activities, and assists customers in all stages from pattern design to imprinted pattern.

The NILT team consists of highly motivated and skilled engineers striving for delivering high quality one-stop solutions.