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Electron-beam lithography

direct write patterning process that uses a focused, concentrated stream of electrons to modify the solubility of a resist layer [SOURCE: ISO/TS 80004-8 v1, 7.1.7]

Raith America, Inc.
Raith America, Inc.
2805 Veterans Highway Suite 23 Ronkonkoma, New York 11779 USA

Raith offers innovative instrument solutions for electron beam lithography, ion beam lithography, nano manipulation, electron beam induced deposition and etching.

Since two decades Raith instruments are extensively used within the nano fabrication and nano engineering community. Raith made conventional electron beam lithography accessible to a broad research community world wide.

With sub 10 nm linewidth guaranteed, Raith electron beam lithography systems provide state of the art performance.

James Watt Nanofabrication Centre
James Watt Nanofabrication Centre
James Watt Building University of Glasgow Glasgow, G12 8QQ UK

The James Watt Nanofabrication Centre @ Glasgow houses over £22M of nanofabrication tools in a 750m2 clean room run as a pseudo-industrial operation by 14 technicians and 4 PhD level research technologists.

Glasgow has over 30 years experience of delivering micro- and nano-fabrication (and in particular electron-beam lithography) to develop solutions in processing, nanotechnology, nanoelectronics, optoelectronics, mm-wave & terahertz, bioengineering, biotechnology, lab-on-a-chip, cleantech & energy, photovoltaics, security & defence and a host of other applications.

Eulitha AG
Eulitha AG
Industriestrasse Althau 1 5303 Würenlingen, Switzerland

Eulitha is a pioneer and leader in production of high-quality nanostructures using advanced lithography techniques. We offer custom-made and standardized nanostructures with resolution extending down to sub-20 nm region.

Eulitha introduced the revolutionary technology in 2010 for low-cost fabrication of photonic nanostructures over large areas. PHABLE is a proprietary lithography technology that is designed to enable production of energy efficient LEDs, solar cells and LCD displays.

Lurie Nanofabrication Facility
Lurie Nanofabrication Facility
1301 Beal Avenue Ann Arbor, MI 48109 USA

The mission of the LNF is to provide effective, efficient, safe, and socially responsible access to advanced nanofabrication equipment and expertise thereby promoting, enabling, and encouraging cutting-edge education, research and business development from materials and individual process steps to entire systems.

Krishna P. Singh Center for Nanotechnology
Krishna P. Singh Center for Nanotechnology
School of Engineering and Applied Science 3205 Walnut Street Philadelphia, PA 19104 USA

The Krishna P. Singh Center for Nanotechnology is a premier facility that integrates state-of-the-art nanotechnology equipment.

Designed by Weiss/Manfredi and due to open in 2013, the 78,000 gross square foot facility will house several multi-user experimental laboratories critical to advanced research and development in nanotechnology. The following connected sections comprise the major components of the building:

NIL Technology ApS
NIL Technology ApS
Diplomvej 381 Kongens Lyngby, DK-2800 Denmark

NIL Technology ApS (NILT) specializes in nanopatterning and nanoimprint lithography. NILT has experience in meeting complex demands for research and new product development activities, and assists customers in all stages from pattern design to imprinted pattern.

The NILT team consists of highly motivated and skilled engineers striving for delivering high quality one-stop solutions.

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