Nanopatterning/Lithography
reproducible creation of a pattern [SOURCE: ISO/TS 80004-8 v1, 3.6]
- 3D lithography
- Block copolymer lithography
- Block copolymer templating
- Colloidal crystal template lithography
- Deep ultraviolet (DUV) lithography
- Dip-pen nanolithography
- Electron-beam lithography
- Extreme ultraviolet (EUV) lithography
- Focused ion-beam (FIB) lithography
- Immersion optics
- Interference lithography
- Ion beam writing
- Ion projection lithography
- Micro-contact printing
- Microfluidic deposition
- Nano-imprint lithography (NIL)
- Nanoscale
- Natural lithography
- Optical lithography
- Phase-contrast photolithography
- Photolithography
- Plasmonic lithography
- Scanning force probe writing
- Scanning tunnelling microscope chemical vapour deposition (STM CVD)
- Soft Lithography
- X-ray lithography
Heidelberg Instruments Inc.
2539 W 237th St Suite A
Torrance, CA 90505
United States
With an installation base of over 850 systems worldwide, Heidelberg Instruments is a world leader in the production of high-precision photolithography systems and maskless aligners. Due to their flexibility, these systems are used in research, development and industrial applications for direct writing and photomask production by some of the most prestigious universities and industry leaders. Applications include MEMS, BioMEMS, nanotechnology, ASICS, TFT, plasma displays, micro optics and others.
NIL Technology ApS
Diplomvej 381
Kongens Lyngby, DK-2800
Denmark
NIL Technology ApS (NILT) specializes in nanopatterning and nanoimprint lithography. NILT has experience in meeting complex demands for research and new product development activities, and assists customers in all stages from pattern design to imprinted pattern.
The NILT team consists of highly motivated and skilled engineers striving for delivering high quality one-stop solutions.
